We have located links that may give you full text access.
Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method.
Nanotechnology 2018 Februrary 24
This paper presents an improved three-step wet etching method for the fabrication of single-crystal silicon nanopores and nanoslists. A diffusion model was built to analyze the influence of the color-based feedback mechanism on the final pore size. Reference structures were added aside normal pore patterns, to obtain a more precise control of the pore size during the pore opening process. By using this method, square nanopores with the minimum size of 8 nm × 8 nm, rectangle nanopores and nanoslits with feature sizes down to 5 nm were successfully obtained. Focused ion beam cutting revealed that the nanopore profile keeps well the inverted-pyramid shape, with an included angle of 54.7°.
Full text links
Related Resources
Get seemless 1-tap access through your institution/university
For the best experience, use the Read mobile app
All material on this website is protected by copyright, Copyright © 1994-2024 by WebMD LLC.
This website also contains material copyrighted by 3rd parties.
By using this service, you agree to our terms of use and privacy policy.
Your Privacy Choices
You can now claim free CME credits for this literature searchClaim now
Get seemless 1-tap access through your institution/university
For the best experience, use the Read mobile app