Role of Oxygen Deposition Pressure in the Formation of Ti Defect States in TiO 2 (001) Anatase Thin Films.

We report the study of anatase TiO2 (001)-oriented thin films grown by pulsed laser deposition on LaAlO3 (001). A combination of in situ and ex situ methods has been used to address both the origin of the Ti3+ -localized states and their relationship with the structural and electronic properties on the surface and the subsurface. Localized in-gap states are analyzed using resonant X-ray photoelectron spectroscopy and are related to the Ti3+ electronic configuration, homogeneously distributed over the entire film thickness. We find that an increase in the oxygen pressure corresponds to an increase in Ti3+ only in a well-defined range of deposition pressure; outside this range, Ti3+ and the strength of the in-gap states are reduced.