Aerosol-assisted chemical vapor deposition of WS 2 from the single source precursor WS(S 2 )(S 2 CNEt 2 ) 2 .

WS(S2 )(S2 CNEt2 )2 has been successfully employed in the aerosol-assisted chemical vapor deposition of WS2 at temperatures above 350 °C. This precursor was found to decompose primarily through the loss of H2 S, CS2 , and SCNEt. The WS2 deposits were characterized by scanning electron microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, and X-ray diffraction. The deposits exhibited plate-like structures growing vertically from the substrate.