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Photostability of pulsed-laser-deposited As<sub>x</sub>Te<sub>100-x</sub> (x=40, 50, 60) amorphous thin films.
Optics Letters 2017 May 2
As<sub>x</sub>Te<sub>100-x</sub> amorphous thin films were fabricated by a pulsed laser deposition technique with the aim of finding photostable layers in as-deposited but preferably in relaxed (annealed) state. Photostability was studied in terms of the films' stability of refractive index and bandgap under near-bandgap light irradiation. As<sub>40</sub>Te<sub>60</sub> and As<sub>50</sub>Te<sub>50</sub> layers were found to be photostable in both as-deposited as well as relaxed states. Moreover, As<sub>50</sub>Te<sub>50</sub> layers present the lowest surface roughness. These characteristics make pulsed-laser-deposited As<sub>50</sub>Te<sub>50</sub> thin films promising for applications in nonlinear optics.
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