Comparison of diffraction patterns exposed by pulsed and CW lasers on positive-tone photoresist.

Two different grating formation geometries for recording onto the positive-tone photoresist with pulsed laser and continuous-wave sources are analyzed and compared. Diffraction efficiency measurements and atomic force microscopy (AFM) examination have been performed in order to investigate the optical and topographical properties of the recorded structures. Gratings patterned by a continuous-wave laser and by a pulsed laser working in the single pulse and multipulse regimes showed different surface roughness and optical properties. The possible reasons for surface roughness and effective exposure differences between gratings created with pulsed and continuous-wave laser radiations are discussed. The processing schemes for diffractive structures patterned by pulsed laser onto positive-tone photoresist for commercial hologram production are analyzed and presented in this work.