We have located links that may give you full text access.
Varying stress of SiO<sub>x</sub>C<sub>y</sub> thin films deposited by plasma polymerization.
Applied Optics 2017 Februrary 2
SiO<sub>x</sub>C<sub>y</sub> thin films were deposited by plasma polymerization. The stress of the deposited SiO<sub>x</sub>C<sub>y</sub> thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiO<sub>x</sub>C<sub>y</sub> thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]<sub>c</sub>/[FM]<sub>m</sub>, to control the stress of the deposited plasma polymer films. Multilayers of TiO<sub>2</sub>/SiO<sub>2</sub>/TiO<sub>2</sub> were coated on a SiO<sub>x</sub>C<sub>y</sub> plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10<sup>-4</sup> at 550 nm of the SiO<sub>x</sub>C<sub>y</sub> films. Superior optical performances of SiO<sub>x</sub>C<sub>y</sub> thin films make their use in optical thin films.
Full text links
Related Resources
Get seemless 1-tap access through your institution/university
For the best experience, use the Read mobile app
All material on this website is protected by copyright, Copyright © 1994-2024 by WebMD LLC.
This website also contains material copyrighted by 3rd parties.
By using this service, you agree to our terms of use and privacy policy.
Your Privacy Choices
You can now claim free CME credits for this literature searchClaim now
Get seemless 1-tap access through your institution/university
For the best experience, use the Read mobile app