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Journal Article
Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.
Byproduct-Free Route to Aminosiloxane Monolayers on Silicon/Silicon Dioxide.
Langmuir : the ACS Journal of Surfaces and Colloids 2017 Februrary 22
The chemisorption of N-methyl-aza-2,2,4-trimethylsilacyclopentane from either the solution or the vapor phase produces monolayer films on silicon (oxide) substrates. The formation of a covalent siloxane linkage to the surface by this adsorbate is accompanied by ring opening, which produces no byproduct. The resulting secondary amine reacts with maleic anhydride to produce a carboxylic acid-terminated surface, accompanied by the formation of a stable amide bond. These reactions and their products were characterized by a combination of optical ellipsometry, contact-angle goniometry, and X-ray photoelectron spectroscopy.
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