Electromagnetic induction of nanoscale zerovalent iron particles accelerates the degradation of chlorinated dense non-aqueous phase liquid: Proof of concept.

In this study, a novel electromagnetically enhanced treatment concept is proposed for in situ remediation of a source zone of chlorinated dense non-aqueous phase liquid (DNAPL) that is slowly dissolved, causing contaminated groundwater for centuries. Here, we used polystyrene sulfonate (PSS)-modified nanoscale zerovalent iron (NZVI) particles (ferromagnetic) in combination with a low frequency (LF) (150 kHz) AC electromagnetic field (EMF) to accelerate the degradation of the DNAPLs via enhanced dissolution and reductive dechlorination. Trichloroethylene (TCE) and tetrachloroethylene (PCE) were used in a bench-scaled evaluation. The PSS-modified NZVI successfully targeted the DNAPL/water interface, as evidenced by the Pickering emulsion formation. Dechlorination of TCE- and PCE-DNAPL was measured by quantifying the by-product formation (acetylene, ethene, and ethane). Without magnetic induction heating (MIH) by LF EMF, PSS-modified NZVI transformed TCE- and PCE-DNAPL to ethene and ethane at the rate constants of 12.19 × 10-3 and 1.00 × 10-3  μmol/h/m2 , respectively, following pseudo zero-order reactions. However, four MIH cycles of PSS-NZVI increased the temperature up to 87 °C and increased the rate constants of TCE-DNAPL and PCE-DNAPL up to 14.58 and 58.01 times, respectively, in comparison to the dechlorination rate without MIH. Theoretical analysis suggested that the MIH of the PSS-modified NZVI enhanced the dechlorination of TCE- and PCE-DNAPL via the combination of the enhanced thermal dissolution of DNAPL, the effect of increasing the temperature on the rate constant (the Arrhenius equation), and the accelerated NZVI corrosion. Nevertheless, the effect of the Arrhenius equation was dominant. For the first time, this proof-of-concept study reveals the potential for using polyelectrolyte-modified NZVI coupled with LF EMF as a combined remediation technique for increasing the rate and completeness of in situ chlorinated DNAPL source remediation.