Yuhua Tsai, Yusuke Hashimoto, ZeXu Sun, Takuya Moriki, Takashi Tadamura, Takahiro Nagata, Piero Mazzolini, Antonella Parisini, Matteo Bosi, Luca Seravalli, Tomohiro Matsushita, Yoshiyuki Yamashita
We investigated atomic site occupancy for the Si dopant in Si-doped κ-Ga2 O3 (001) using photoelectron spectroscopy (PES) and photoelectron holography (PEH). From PES and PEH, we found that the Si dopant had one chemical state, and three types of inequivalent Si substitutional sites (SiGa ) were formed. The ratios for the inequivalent tetrahedral, pentahedral, and octahedral SiGa sites were estimated to be 55.0%, 28.1%, and 16.9%, respectively. Higher (lower) ratios for the three inequivalent SiGa sites may come from a lower (higher) formation energy...
March 7, 2024: Nano Letters